Effect of Electrostatic Field on Film Rupture

[+] Author and Article Information
Rama Subba Reddy Gorla

Cleveland State University, Cleveland, OH 44115

Larry W. Byrd

Thermal Structures Branch, Air Vehicles Directorate, Air Force Research Laboratory, Wright Patterson Air Force Base, OH 45433

J. Fluids Eng 121(3), 651-655 (Sep 01, 1999) (5 pages) doi:10.1115/1.2823519 History: Received January 21, 1998; Revised April 05, 1999; Online December 04, 2007


Nonlinear thin film rupture has been analyzed by investigating the stability of films under the influence of a nonuniform electrostatic field to finite amplitude disturbances. The dynamics of the liquid film is formulated using the Navier-Stokes equations including a body force term due to van der Waals attractions. The effect of the electric field is included in the analysis only in the boundary condition at the liquid vapor interface. The governing equation was solved by finite difference method as part of an initial value problem for spatial periodic boundary conditions. The electric field stabilizes the film and increases the time to rupture when a long wavelength perturbation is introduced.

Copyright © 1999 by The American Society of Mechanical Engineers
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